Resume: Dr. Markus D. Groner

---

Postdoctoral Research Associate Department of Chemistry & Biochemistry University of Colorado, 215 UCB Boulder, CO 80309-0215 Phone: (303) 492-7173 Fax: (303) 492-5894 E-mail: Markus.Groner@colorado.edu

Education:

University of Colorado, Boulder, CO
Ph.D. in Analytical Chemistry, Feb. 1999. GPA 3.9
Thesis: Effects of Surface Layers on Electron Transfer at Semiconductor/Liquid Interfaces
Advisor: Dr. Carl A. Koval

University of South Carolina, Honors College, Columbia, SC
B.S. in Chemistry (ACS certified), Dec. 1992. GPA 3.9

Professional Experience:

POSTDOCTORAL RESEARCH ASSOCIATE

Professor Steven M. George, University of Colorado, 4/1999-present

- Deposited excellent Al₂O₃ Diffusion Barriers by Atomic Layer Deposition (ALD) for use in flexible OLEDs

- Measured ultra-low water permeation rates using a tritiated water test

- Developed a new Copper Metal ALD process using a hydrogen plasma

- Characterized electrical properties of thin Al₂O₃ films grown by ALD

- Studied Low temperature Al₂O₃ ALD growth, properties and deposition on polymers

CONSULTANT

Ziyax Corporation, 8/2004

- Helped optimize sputtered alumina film cluster tool by measuring electrical properties

GRADUATE RESEARCH ASSISTANT
      Professor Carl A. Koval, University of Colorado, 1993-1999
- Electron transfer and surface chemistry at silicon electrodes in methanol
- Investigation of hot electrons at illuminated InP/liquid interfaces using RRD voltammetry and capacitance measurements
- Photoproduction of hydrogen at GaAs/GaInP₂ electrodes

TEACHING ASSISTANT, University of Colorado, 1993-1994, 1996-1998
- General chemistry lab and advanced instrumental analysis lab

Selected Publications and Presentations

“Gas Diffusion Barriers on Polymer Films Using Al₂O₃ Atomic Layer Deposition”, M. D. Groner, C. A. Wilson, J. D. Ferguson, and S. M. George, American Vacuum Society 51st International Symposium, Anaheim, CA, Nov. 14-19, 2004.

“Copper Atomic Layer Deposition using in situ-Generated Cu₃Cl₃ and Hydrogen Radicals”, M. D. Groner and S. M. George, AVS Topical Conference on Atomic Layer Deposition "ALD 2003", San Jose, CA, August 4-6 2003.

“Low Temperature Al₂O₃ Atomic Layer Deposition”, M. D. Groner, F. H. Fabreguette, J. W. Elam, and S. M. George, Chemistry of Materials, Volume 16, pp. 639-645, 2004.

“Electrical Properties of Tungsten/Alumina Bilayers Grown by Atomic Layer Deposition: Influence of the Film Roughness”, F. H. Fabreguette, M. D. Groner, Z. A. Sechrist, and S. M. George, in press, 2005.

"High k Dielectrics Deposited by ALD: Capacitor and Gate Applications", Markus D. Groner and Steven M. George in Interlayer Dielectrics for Semiconductor Technologies, S. P. Muraka, M. Elizenberg, and A. K. Sinha, ed., Academic Press, 2003.

"Electrical Characterization of Ultrathin Al₂O₃ Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates", Markus D. Groner, Jeffrey W. Elam, Francois H. Fabreguette, and Steven M. George, Thin Solid Films, Volume 413, pp.186-197, 2002.

"Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Films Growth by Atomic Layer Deposition ", J. W. Elam, M. D. Groner, and S. M. George, Review of Scientific Instruments, Volume 73, pp. 2981-2987, 2002.

"Electron Transfer at n-Silicon/Methanol Interfaces: Effects of Ferricenium Pretreatment and Silicon Dioxide Overlayers", Markus D. Groner and Carl A. Koval, Journal of Electroanalytical Chemistry, Volume 498, pp. 201-208, 2001.

"Further Investigation of the Reduction of Alkyl Bromides at p-InP Photocathodes: Hot or Thermalized Electrons?", Markus D. Groner, David K. Watts, and Carl A. Koval, Journal of the Electrochemical Society, Volume 144, pp. 1690-1696, 1997.